{"id":21,"date":"2021-04-01T11:17:25","date_gmt":"2021-04-01T02:17:25","guid":{"rendered":"http:\/\/nanoimprint.jp\/nnt2022\/?page_id=21"},"modified":"2022-08-15T08:26:14","modified_gmt":"2022-08-14T23:26:14","slug":"program","status":"publish","type":"page","link":"https:\/\/nanoimprint.jp\/nnt2022\/program\/","title":{"rendered":"Program"},"content":{"rendered":"

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\"\"<\/a>\u3000NNT 2022 Final Program and Floor Map<\/th>\n<\/tr>\n<\/thead>\n
Date<\/td><\/td>JP, Asia\t
\n<\/td>		EU(Paris)\t<\/td>US(east)\t<\/td>US(west)<\/td>PROGRAM<\/td>Time zone<\/td>\n<\/tr>\n
5-Oct\t<\/td>afternoon 2h<\/td>12:00-14:50<\/td>(5:00-7:50)\t<\/td>(23:00-1:50)\t<\/td>(20:00-22:50)\t<\/td>Opening and plenary<\/td>for World<\/td>\n<\/tr>\n
<\/td><\/td>14:50-15:50<\/td>(7:50-8:50)<\/td>(1:50-2:50)<\/td>(22:50-23:50)<\/td>On-site: Industrial exhibition
\nOn-line: Industrial exhibition short demo movie <\/td>		for World<\/td>\n<\/tr>\n
<\/td>evening 3h\t<\/td>16:00-19:20<\/td>(9:00-12:20)<\/td>(3:00-6:20)<\/td>(0:00-3:20)<\/td>Oral presentations<\/td>for EU<\/td>\n<\/tr>\n
6-Oct\t
\n<\/td>		morning 2h\t<\/td>8:40-10:30<\/td>(1:40-3:30)\t<\/td>(19:40-21:30)\t<\/td>(16:40-18:30)\t<\/td>Oral presentations<\/td>for World<\/td>\n<\/tr>\n
<\/td>morning 1h<\/td>10:50-11:50<\/td>(3:50-4:50)<\/td>(21:50-22:50)<\/td>(18:50-19:50)<\/td>Industrial exhibition oral presentation 1<\/td>for World<\/td>\n<\/tr>\n
<\/td>afternoon 2h\t<\/td>12:00-14:20\t<\/td>(5:00-7:20)\t<\/td>(23:00-25:20)\t<\/td>(20:00-22:20)\t<\/td>Poster session short presentation <\/td>for World<\/td>\n<\/tr>\n
\t<\/td><\/td>14:20-16:00
\n<\/td>		(7:20-9:00)<\/td>(1:20-3:00)<\/td>(22:20-0:00)<\/td>On-site: Poster session & Industrial exibision<\/td>for JP<\/td>\n<\/tr>\n
\t<\/td>evening 3h\t
\n<\/td>		16:00-19:00\t<\/td>(9:00-12:00)\t<\/td>(3:00-6:00)\t<\/td>(0:00-3:00)\t<\/td>Oral presentations <\/td>for EU<\/td>\n<\/tr>\n
7-Oct
\n<\/td>		morning 2h\t
\n<\/td>		9:00-10:50<\/td>(2:00-3:50)\t<\/td>(20:00-21:50)\t<\/td>(17:00-18:50)\t<\/td>Oral presentation <\/td>for US<\/td>\n<\/tr>\n
<\/td>morning 1h\t<\/td>11:00-12:00<\/td>(4:00-5:00)\t<\/td>(22:00-23:00)<\/td>(19:00-20:00)<\/td> Industrial exhibition oral presentation 2<\/td>for World<\/td>\n<\/tr>\n
<\/td>afternoon 2h\t<\/td>12:10-14:20<\/td>(5:10-7:20)<\/td>(23:10-1:20)<\/td>(23:10-1:20)\t<\/td>Plenary and closing\t<\/td>for World<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n
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NNT 2022 Program
\n
\n<\/th>\n<\/tr>\n<\/thead>\n
October 5, 2022
\nSession Room: Room A (2F)
\nTechnical Exhibition, Poster Session and Coffee Break (3F)<\/td>\n<\/tr>\n
<\/td><\/td>\n<\/tr>\n
5A-1: Opening and Plenary Session I (12:00-14:50)<\/td>\n<\/tr>\n
5A-1-1\t
\n12:00-12:10
\n<\/td>		Opening Remark
\nProf. Y. Hirai (Osaka Metrpolitan Univ., Japan)<\/td>\n<\/tr>\n
5A-1-2\t
\n12:10-12:50
\n<\/td>		(Plenary)
\nStephen Y. Chou, Princeton Univ., USA
\n<\/td>\n<\/tr>\n
5A-1-3\t
\n12:50-13:30\t\t\t
\n<\/td>		Nanoimprinting \u2013 From Niche to High Volume Manufacturing (Plenary)
\nThanner Christine, EV Group, Austria<\/td>\n<\/tr>\n
5A-1-4\t
\n13:30-14:10
\n<\/td>		Nanoimprint Lithography for Semiconductor Manufacturing (Plenary)
\nAnupam MITRA, KIOXIA, Japan<\/td>\n<\/tr>\n
5A-1-5\t
\n14:10- 14:50
\n<\/td>		(Plenary)
\nMasayuki Abe, Asahi Kasei, Japan<\/td>\n<\/tr>\n
5A-2: Video & industry I (14:50-15:50) (Video Session)<\/td>\n<\/tr>\n
5A-2-T1\t
\n14:50-14:55
\n<\/td>		GEOMATEC Co., Ltd.
\n<\/td>\n<\/tr>\n
5A-2-T2\t
\n14:55-15:00
\n<\/td>		Autex Inc.
\n<\/td>\n<\/tr>\n
5A-2-T3\t
\n15:00-15:05
\n<\/td>		Meisho Kiko Co., Ltd.
\n<\/td>\n<\/tr>\n
5A-2-T4\t
\n15:05-15:10
\n<\/td>		Canon Inc.
\n<\/td>\n<\/tr>\n
5A-2-T5\t
\n15:10-15:15
\n<\/td>		Iwasaki Electric Co., Ltd.
\n<\/td>\n<\/tr>\n
5A-2-T6\t
\n15:15-15:20
\n<\/td>		Ohara Quartz.Co.,Ltd.
\n<\/td>\n<\/tr>\n
5A-2-T7\t
\n15:20-15:25
\n<\/td>		TOKYO OHKA KOGYO CO., LTD.
\n<\/td>\n<\/tr>\n
5A-2-T8\t
\n15:25-15:30
\n<\/td>		ZEON CORPORATION
\n<\/td>\n<\/tr>\n
5A-2-T9\t
\n15:30-15:35
\n<\/td>		Obducat AB<\/td>\n<\/tr>\n
5A-2-T10\t
\n15:35-15:40
\n<\/td>		Gunei Chemical Industry Co., Ltd.<\/td>\n<\/tr>\n
5A-2-T11\t
\n15:40-15:45
\n<\/td>		TAZMO CO., LTD.<\/td>\n<\/tr>\n
5A-2-T12\t
\n15:45-15:50
\n<\/td>		KYODO INTERNATIONAL INC.<\/td>\n<\/tr>\n
5A-3: Evening Session I (16:00-17:30)<\/td>\n<\/tr>\n
5A-3-1\t
\n16:00-16:30
\n<\/td>		Roll-to-Plate Nanoimprint Lithography for mass manufacturing of NanoOptics (Invited)
\nJan Matthijs ter Meulen, Morponics, The Netherlands
\n<\/td>\n<\/tr>\n
5A-3-2\t
\n16:30-16:50
\n<\/td>		High-resolution nanoimprint lithography of pharmaceutical ingredients containing volatile solvents achieved with gas-permeable porous mold\t
\nRio Yamagishi 1, Sayaka Miura 1, Kaori Yasuda 1, Riku Miyazaki 1, Yuki Kawano 2, Yoshiyuki Yokoyama 2, Naoto Sugino 3, Takao Kameda 3,
\nSatoshi Takei 1, 1 Toyama Pref. Univ., 2 Toyama Industrial Technol. Res. and Development Center and 3 Sanko Gosei, Japan
\n<\/td>\n<\/tr>\n
5A-3-3\t
\n16:50-17:10
\n<\/td>		Nanoimprinted speckle patterns for mechanical testing using digital image correlation analysis\t
\nE.C. Kursun 1, S. Supreeti 2, K.G.F. Janssens 1, H. Schift 1, P. Sp\u00e4tig 1, 1 Paul Scherrer Inst., Switzerland, 2 Technische Univ. Ilmenau, Germany
\n<\/td>\n<\/tr>\n
5A-3-4\t
\n17:10-17:30
\n<\/td>		Defect reduction technology in replica template process\t
\nRyo Kobayashi, Akihiko Ando, Hideaki Sakurai and Shingo Kanamitsu, Kioxia, Japan
\n<\/td>\n<\/tr>\n
17:30-17:50 \t\t
\n<\/td>		Break<\/td>\n<\/tr>\n
5A-4: Evening Session II (17:50-19:20)<\/td>\n<\/tr>\n
5A-4-1\t
\n17:50-18:20
\n<\/td>		Nanoimprinted meta-surface(meta-lens) (Invited)
\nHeon Lee, Korea Univ., Korea
\n<\/td>\n<\/tr>\n
5A-4-2\t
\n18:20-18:40
\n<\/td>		Chiral Crystallization Directed by Chiral Near-Field Force with Nanostructured Plasmonic Metasurfaces\t
\nHiromasa Niinomi 1, An-Chieh Cheng 2, Teruki Sugiyama 3, Miho Tagawa 4, Hiroshi Yoshikawa 5, Satoshi Uda 1, Tomoya Oshikiri 1 and
\nMasaru Nakagawa 1, 1 Tohoku Univ., 2 Hokkaido Univ., 3 National Yang Ming Chiao Tung Univ., Taiwan, 4 Nagoya Univ., 5 Osaka Univ., Japan
\n<\/td>\n<\/tr>\n
5A-4-3\t
\n18:40-19:00
\n<\/td>		NIL-Based Patterning of Chemically Strengthened Glasses
\nJo\u00e3o Gaspar 1, Ye Zhou 1, Prasanna Venkatesh Krishnan 1, Kristian Thulin 1, Patrik Lundstr\u00f6m 1, Virginia Soares 2 and Virginia Chu 2,
\n1 Obducat Technologies, Sweden and 2 INESC MN, Portugal
\n<\/td>\n<\/tr>\n
5A-4-4\t
\n19:00-19:20
\n<\/td>		Effects of planetary spin-coating on the preparation of thin films for imprinting\t
\nKazuki Tokumaru and Koichiro Ogata, Natl. Inst. of Technol., Oita College, Japan
\n<\/td>\n<\/tr>\n
October 6, 2022<\/td>\n<\/tr>\n
6A-5: Morning Session I (8:40-10:30)<\/td>\n<\/tr>\n
6A-5-1\t
\n8:40-9:10
\n<\/td>		From Visible Wavelengths to Near Infrared: Direct Nanoimprint Lithography for High Aspect Ratio, All-Inorganic Metalenses,
\nWaveguides and Diffractive Optics
\nVincent J. Einck, Andrew McClung, Dae Eon Jung, Amir Arbabi and James J. Watkins, Univ. of Massachusetts, USA
\n<\/td>\n<\/tr>\n
6A-5-2\t
\n9:10-9:30
\n<\/td>		Filler-Free NIL Compatible Ultra-High Refractive Index Resins for Patterning Diffractive Optical Elements \t
\nCarlos Pina-Hernandez and Keiko Munechika, HighRI Optics, USA
\n<\/td>\n<\/tr>\n
6A-5-3\t
\n9:30-9:50
\n<\/td>		Atom-scale-precision fluorescence alignment demonstrated by computational simulation\t
\nHiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa and Masaru Nakagawa, Tohoku Univ., Japan
\n<\/td>\n<\/tr>\n
6A-5-4\t
\n9:50-10:10
\n<\/td>		High efficiency crystalline metalens with TiO2 sol gel process\t
\nWonjoong Kim 1, Joohoon Kim 2, Chanwoong Park 1, Hojung Choi 1, Ick Chan Joo 3, Junsuk Rho 2,4,5 and Heon Lee 1, 1 Korea Univ.,
\n2 POSTECH, 3 MIRTEC, 4 POSCO-POSTECH-RIST and 5 NINT, Korea
\n<\/td>\n<\/tr>\n
6A-5-5\t
\n10:10-10:30
\n<\/td>		Photoluminescence enhancement by electric and magnetic surface lattice resonance in ZrO2 nanoparticle arrays\t
\nM. Higashino, S. Murai, T. Y. Lo, S. Tomita, K. Tanaka, Kyoto Univ., Japan
\n<\/td>\n<\/tr>\n
10:30-10:50\t
\n<\/td>		Coffee Break (3F)<\/td>\n<\/tr>\n
6A-6: Oral & industry I (10:50-11:50) (Pending)<\/td>\n<\/tr>\n
6A-6-T1\t
\n10:50-11:00
\n<\/td>		GEOMATEC Co., Ltd.
\n<\/td>\n<\/tr>\n
6A-6-T2\t
\n11:00-11:10
\n<\/td>		Autex Inc.
\n<\/td>\n<\/tr>\n
6A-6-T3\t
\n11:10-11:20
\n<\/td>		Meisho Kiko Co., Ltd.
\n<\/td>\n<\/tr>\n
6A-6-T4\t
\n11:20-11:30
\n<\/td>		Canon Inc.
\n<\/td>\n<\/tr>\n
6A-6-T5\t
\n11:30-11:40
\n<\/td>		Iwasaki Electric Co., Ltd.
\n<\/td>\n<\/tr>\n
6A-6-T6\t
\n11:40-11:50
\n<\/td>		Ohara Quartz.Co.,Ltd.
\n<\/td>\n<\/tr>\n
6A-7: Poster Short Presentation (Video Session) (12:00-14:20)
\n<\/td>\n<\/tr>\n
6A-7-P1\t
\n12:00-12:05
\n<\/td>		Withdrawn
\nOptimizing the Residual Layer Uniformity Using Inkjet Printing Technology\t
\nSimon Drieschner, Fabian Kloiber, Priya Sai, Wiljan Stouwdam, Wouter Brok, Vijay R. Kolli and Marc Hennemeyer, SUSS MicroTec Solutions, Germany<\/del>
\n<\/td>\n<\/tr>\n
6A-7-P2\t
\n12:05-12:10
\n<\/td>		Gas-permeable porous mold in nanoimprint lithography for super engineering plastic\t
\nSatoshi Takei 1, Sayaka Miura 1, Rio Yamagishi 1, Naoto Sugino 2, Takao Kameda 2, Yuki Kawano 3 and Yoshiyuki Yokoyama 3,
\n1 Toyama Pref. Univ., 2 Sanko Gosei and 3 Toyama Industrial Technol. Res. and Devel. Center, Japan
\n<\/td>\n<\/tr>\n
6A-7-P3\t
\n12:10-12:15
\n<\/td>		Formation of the atomically stepped surface of the spin-coated PEDOT:PSS conducting polymer thin film by thermal nanoimprinting\t
\nYuto Maeda 1, Naho Kaneko 1, Tomoaki Oga 1, Satoru Kaneko 2,1, Akifumi Matsuda 1 and Mamoru Yoshimoto 1,
\n1 Tokyo Inst. of Technol. and 2 Kanagawa Inst. Industrial. Sci. & Technol., Japan
\n<\/td>\n<\/tr>\n
6A-7-P4\t
\n12:15-12:20
\n<\/td>		Influence of atomic-scale thermal-nanoimprint patterning and surface modification of the polymer substrate on growth of functional oxide thin films\t
\nTomoaki Oga 1, Hisashi Miyazaki 2, Satoru Kaneko 3,1, Akifumi Matsuda 1 and Mamoru Yoshimoto 1,
\n1 Tokyo Inst. of Technol., 2 Natl. Defense Academy and 3 Kanagawa Inst. of Industrial Sci. and Technol., Japan
\n<\/td>\n<\/tr>\n
6A-7-P5\t
\n12:20-12:25
\n<\/td>		High Aspect Ratio Nanopillars fabricated by UV Nanoimprint Lithography\t
\nOliver S. Maier 1, Michael J. Haslinger 1, Michael M\u00fchlberger 1, Sonja Kopp 1, Markus Pribyl 2, Philipp Taus 2, Heinz D. Wanzenboeck 2
\nand Elena Guillen 1,
\n1 PROFACTOR and 2 Vienna Univ. of Technol., Austria
\n<\/td>\n<\/tr>\n
6A-7-P6\t
\n12:25-12:30
\n<\/td>		The Study of Bile Duct Stent Having Antifouling Properties Using Biomimetics Technique\t
\nAtsushi Sekiguchi 1,2, 1 Osaka Metropolitan Univ. and 2 Litho Tech Japan, Japan
\n<\/td>\n<\/tr>\n
6A-7-P7\t
\n12:30-12:35
\n<\/td>		Computational study on the releasing process of slanted diffraction structure for AR glasses\t
\n1 Ryuhei Yamamura, 2 Yuusei Kunitou, 1 Kai Kameyama, 2 Masaaki Yasuda and 2 Yoshihiko Hirai,
\n1 Osaka Pref. Univ. and 2 Osaka Metropolitan Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P8\t
\n12:35-12:40
\n<\/td>		Stochastic Simulation of Deactivation Effects in UV Curable Resin\t
\nD. Nakamura, Y. Hirai, and M. Yasuda, Osaka Metropolitan Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P9\t
\n12:40-12:45
\n<\/td>		Compatibility of Thermal Property among in Nanoimprint Resin\t
\nKai Kameyama 1, Yuusei Kunitou 2, Hiroaki Kawata 2, Masaaki Yasuda 2 and Yoshihiko Hirai 2, 1 Osaka Pref. Univ. and
\n2 Osaka Metropoiltan Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P10\t
\n12:45-12:50
\n<\/td>		Study on smart process window design for thermal nanoimprint lithography using deep learning systems\t
\nYuusei Kunitou 1, Ryuhei Yamamura 2, Kai Kameyama 2, Masaaki Yasuda 1 and Yoshihiko Hirai 1, Osaka Metropolitan Univ. and
\n2 Osaka Pref. Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P11\t
\n12:50-12:55
\n<\/td>		Investigation of filling behavior of UV nanoimprint by bridge structure\t
\nYusuke Murakami and Jun Taniguchi, Tokyo Univ. of Sci., Japan
\n<\/td>\n<\/tr>\n
6A-7-P12\t
\n12:55-13:00
\n<\/td>		Two-tone pattern transfer using nanoimprint and silver ink\t
\nK. Enomoto and J. Taniguchi, Tokyo Univ. of Sci., Japan
\n<\/td>\n<\/tr>\n
6A-7-P13\t
\n13:00-13:05
\n<\/td>		Transfer durability of low concentration release agent coated replica mold with line and space patterns on ultraviolet nanoimprint lithography\t
\nTomohito Wakasa and Jun Taniguchi, Tokyo Univ. of Sci., Japan
\n<\/td>\n<\/tr>\n
6A-7-P14
\n13:05-13:10
\n<\/td>		Crystal growth of GaN based nanowires using SiO2 masks formed by nanoimprint lithography process\t
\nMizuki Takahashi, Shiori Yamamura, Yukimi Jinno, Nanami Nakayama, Sae Katsuro, Yuki Yamanaka, Shiori Ii, Ayaka Shima, Soma Inaba,
\nTetsuya Takeuchi, Motoaki Iwaya, Satoshi Kamiyama, Meijo Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P15\t
\n13:10-13:15
\n<\/td>		Antibacterial property dependent with the nanopillar pitch on the plastic film\t
\nNatsuki Ogawa, Tomohiro Shimizu, Shoso Shingubara, Takeshi Ito, Kansai Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P16\t
\n13:15-13:20
\n<\/td>		Effect of nanopillar size on bactericidal and antibacterial properties\t
\nIkki Shingeya, Tomohiro Shimizu, Shoso Shingubara and Takeshi Ito, Kansai Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P17\t
\n13:20-13:25
\n<\/td>		Selection of adhesive molecular layers with monomer-repellence and chemisorption for a shape-fixed residual layer in UV nanoimprint lithography\t
\nKanta Kawasaki, Akiko Onuma, Hiromasa Niinomi, and Masaru Nakagawa, Tohoku Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P18\t
\n13:25-13:30
\n<\/td>		Prediction of Durability of the Mold for Production of Nanostructures in Ultraviolet Nanoimprint Lithography (UV-NIL) using Machine Learning\t
\nYuta Aoki, Junichiro Ono, Tomohito Wakasa, Jun Taniguchi and Shin-ichi Satake, Tokyo Univ. of Sci., Japan
\n<\/td>\n<\/tr>\n
6A-7-P19\t
\n13:30-13:35
\n<\/td>		Molecular dynamics study of effects of loading pressure on shear properties of organic nanofilms\t
\nNaoki Matamoto and Kazuhiro Tada, National Inst. of Technol., Toyama College, Japan
\n<\/td>\n<\/tr>\n
6A-7-P20\t
\n13:35-13:40
\n<\/td>		Fabrication of Ag nanoantenna sticker and application to luminescence control \t
\nTienYang Lo, Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P21\t
\n13:40-13:45
\n<\/td>		Fabrication of Flexible Sticker of Si metasurface by a Transfer Process\t
\nYuto Inoue, Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P22\t
\n13:45-13:50
\n<\/td>		Fabrication of rose petal effect film by moth-eye structure mold and photolithography\t
\nKazuki Araia, Takuto Wakasaa, Kazuki Fujiwaraa and Jun Taniguchia, Tokyo Univ. of Sci., Japan
\n<\/td>\n<\/tr>\n
6A-7-P23\t
\n13:50-13:55
\n<\/td>		Analysis of resistance against deformation stress of nanofilaments inside clingfish mimicked tape by using FEM simulation\t
\nKazuma Tsujioka 1, Yasutaka Matsuo 1,3, Yuji Hirai 2 and Masatsugu Shimomura 2, 1 Hokkaido Univ. and 2 CIST, Japan
\n<\/td>\n<\/tr>\n
6A-7-P24\t
\n13:55-14:00
\n<\/td>		Nanoimprint and nanoprint processes using Seamless Roller Mold\t
\nMakoto Okada, Asahi Kasei, Japan
\n<\/td>\n<\/tr>\n
6A-7-P25\t
\n14:00-14:05
\n<\/td>		Micromolds for glass molding by the carbonization of epoxy resist made by laser direct write lithography\t
\nMuhammad Refatul Haq and Helmut Schift, Paul Scherrer Inst., Switzerland
\n<\/td>\n<\/tr>\n
6A-7-P26\t
\n14:05-14:10
\n<\/td>		Fabrication of self-standing PMMA film with 0.5 \u03bcn through-holes by imprint and photolithography hybrid process\t
\nH. Kawata, M. Yasuda, Y. Hirai, and H. Kikuta, Osaka Metropolitan Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P27\t
\n14:10-14:15
\n<\/td>		Imprint process for glass nano-patterning using silica nano powder\t
\nYu Kubota and Fujio Tsumori, Kyushu Univ., Japan
\n<\/td>\n<\/tr>\n
6A-7-P28\t
\n14:15-14:20
\n<\/td>		MICRO-POWDER-IMPRINTING USING MOLDS WITH SIMILAR SCALE TO CERAMIC NANO PARTICLE\t
\nRyoma Taira and Fujio Tsumori, Kyushu Univ., Japan
\n<\/td>\n<\/tr>\n
6A-8: Poster session & Industrial exhibition On-site (14:20-16:00) (3F)<\/td>\n<\/tr>\n
6A-8<\/td>Poster Session <\/td>\n<\/tr>\n
<\/td><\/td>\n<\/tr>\n
6A-9: Evening Session III (16:00-17:30)<\/td>\n<\/tr>\n
6A-9-1\t
\n16:00-16:30
\n<\/td>		Electric-field-driven jet deposition micro-nano 3D printing and its applications in manufacturing advanced circuits and electronics (Invited)
\nHongbo Lan, Qingdao University of Technology, Qingdao, China
\n<\/td>\n<\/tr>\n
6A-9-2\t
\n16:30-16:50
\n<\/td>		Hierarchical Micro-\/Nanostructured Substrates for the Growth of Cardiomyocytes made by Nanoimprint Lithography\t
\nMichael M\u00fchlberger 1, Sonja Kopp 1, Alison Deyett 2, Markus Pribyl 3, Michael Haslinger 1, Anica Siegel 1, Philipp Taus 3, Elena Guillen 1,
\nAranxa Torres Caballero 2, Bozhidar Baltov 4, Leif Yde 5, Jan Stensborg 5, Sasha Mendjan 2, Steffen Hering 4, Heinz D. Wanzenboeck 3,
\n1 PROFACTOR, Austria, 2 Institute of Molecular Biotechnology, 3 Technical Univ. Wien, 4 Chanpharm, Austria and 5 Stensborg, Denmark
\n<\/td>\n<\/tr>\n
6A-9-3\t
\n16:50-17:10
\n<\/td>		\"Development of optical anti-reflection with anti-fogging property combined with nanostructure and specially designed vacuum deposition
\nKazuma Kurihara and Hokari Ryohei, AIST, Japan
\n<\/td>\n<\/tr>\n
6A-9-4\t
\n17:10-17:30
\n<\/td>		Analysis of Elastic Contacts in Chemical Mechanical Polishing by using Nanoimprint Lithography as a Characterization Method\t
\nJoscha S. Kappel 1, Robert Kirchner 2, Sascha Bott 3, Benjamin Lilienthal-Uhlig 1, Johann W. Bartha 2, 1 Fraunhofer-IPMS,
\n2 Dresden Univ. of Technol., 3 GlobalFoundries Dresden Module One, Germany
\n<\/td>\n<\/tr>\n
17:30-17:50\t\t
\n<\/td>		Coffee Break<\/td>\n<\/tr>\n
<\/td><\/td>\n<\/tr>\n
6A-10: Evening Session IV (17:50-19:00) <\/td>\n<\/tr>\n
6A-10-1\t
\n17:50-18:20
\n<\/td>		Demonstration of Micromirror Fabrication for Co-packaged Optics Using UV Nanoimprint\u3000(Invited)
\nF. Nakamura 1, K. Suzuki 2, A. Noriki 2 and T. Amano 2, 1 PETRA and 2 AIST, Japan<\/td>\n<\/tr>\n
6A-10-2\t
\n18:20-18:40
\n<\/td>		Combining UV-curable polymeric materials for advanced optical designs\t
\nM. Brehm, R. Richter, M. Trinkwalder, M. Follner and S. Prinz, DELO Industrial Adhesives, Germany
\n<\/td>\n<\/tr>\n
6A-10-3\t
\n18:40-19:00
\n<\/td>		Antibacterial film using oligoglucosamine derivatives in nanoimprint lithography utilizing biomimetics technology\t
\nSayaka Miura 1, Rio Yamagishi 1, Riku Miyazaki 1, Kaori Yasuda 1, Naoto Sugino 2, Takao Kameda 2, Yuki Kawano 3, Yoshiyuki Yokoyama 3,
\nSatoshi Takei 1, 1 Toyama Prefectural Univ., 2 Sanko Gosei and 3 Toyama Industrial Technol. Res. and Development Center Japan
\n<\/td>\n<\/tr>\n
October 7, 2022<\/td>\n<\/tr>\n
7A-11: Morning Session II (9:00-10:50)<\/td>\n<\/tr>\n
7A-11-1\t
\n9:00-9:30
\n<\/td>		Ultra-High Throughput Electron Beam Lithography System for Nanoimprint Mold Fabrication (Invited)\t
\nTakaomi Ito 1, Takumi Watanabe 1, Satoshi Nagai 1, Sung-won Youn 2, Kenta Suzuki 2 and Hiroshi Hiroshima 2, 1 Elionix and 2 AIST, Japan
\n<\/td>\n<\/tr>\n
7A-11-2\t
\n9:30-9:50
\n<\/td>		Nanofabrication of metal\/semiconductor\/metal structure for efficient photocathode under strong coupling condition\t
\nTomoya Oshikiri 1, Xu Shi 2, Hiroaki Misawa 2,3 and Masaru Nakagawa 1, 1 Tohoku Univ., 2 Hokkaido Univ., Japan and
\n3 National Yang Ming Chiao Tung Univ., Taiwan
\n<\/td>\n<\/tr>\n
7A-11-3\t
\n9:50-10:10
\n<\/td>		Nanoimprint-based plasmonic\/non-plasmonic lattices for controlling light
\nShunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., Japan
\n<\/td>\n<\/tr>\n
7A-11-4\t
\n10:10-10:30
\n<\/td>		A novel optical diffuser inspired by Morpho butterfly\u2019s nanostructure enables skillful light diffusion and self-cleaning properties\t
\nKazuma Yamashita 1, Takuma Hattori 1,2, Yuji Kuwahara 1,2 and Akira Saito 1,2, 1 Osaka Univ. and 2 RIKEN Spring-8, Japan
\n<\/td>\n<\/tr>\n
7A-11-5\t
\n10:30-10:50
\n<\/td>		Simple Preparation of the Multi-functional Vulcanized Rubber Microstructures\t
\nYuji Hirai 1, Syun Uemura 1, Yasutaka Matsuo 2, Takahiro Okamatsu 3, Toshihiko Arita 4, Masatsugu Shimomura 1,
\n1 Chitose Institute of Technol., 2 Hokkaido Univ., 3 YOKOHAMA RUBBER and 4 Tohoku Univ., Japan
\n<\/td>\n<\/tr>\n
10:50-11:00\t
\n<\/td>		Break<\/td>\n<\/tr>\n
7A-12: Oral & Industry II (11:00-12:00) Pending<\/td>\n<\/tr>\n
7A-12-T7\t
\n11:00-11:10
\n<\/td>		TOKYO OHKA KOGYO CO., LTD.<\/td>\n<\/tr>\n
7A-12-T8\t
\n11:10-11:20
\n<\/td>		ZEON CORPORATION
\n<\/td>\n<\/tr>\n
7A-12-T9\t
\n11:20-11:30
\n<\/td>		Obducat AB<\/td>\n<\/tr>\n
7A-12-T10\t
\n11:30-11:40
\n<\/td>		Gunei Chemical Industry Co., Ltd.<\/td>\n<\/tr>\n
7A-12-T11\t
\n11:40-11:50
\n<\/td>		TAZMO CO., LTD.<\/td>\n<\/tr>\n
7A-12-T12\t
\n11:50-12:00
\n<\/td>		KYODO INTERNATIONAL INC.<\/td>\n<\/tr>\n
7A-13: Plenary session II (12:10-14:20) <\/td>\n<\/tr>\n
7A-13-1
\n12:10-12:50
\n<\/td>		Development of Nanoimprint Lithography Tool (Plenary)
\nToshiki Ito, CANON, Japan<\/td>\n<\/tr>\n
7A-13-2\t
\n12:50-13:30
\n<\/td>		Nanoimprint Technology for Plasmonic Sensors and Metadevices (Plenary)
\nStella W. Pang, City Univ. of Hong Kong<\/td>\n<\/tr>\n
7A-13-3\t
\n13:30-14:10
\n<\/td>		Back to the future - nanoimprint revisited (Plenary)
\nHelmut Schift, Paul Scherrer Institut, Switzerland<\/td>\n<\/tr>\n
7A-13-4\t
\n14:10-14:20
\n<\/td>		Closing Remark: \t
\nStephen Y. Chou, Princeton Univ., USA
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