{"id":97,"date":"2022-01-19T15:23:25","date_gmt":"2022-01-19T06:23:25","guid":{"rendered":"https:\/\/nanoimprint.jp\/nnt2022\/?page_id=97"},"modified":"2022-09-28T11:37:16","modified_gmt":"2022-09-28T02:37:16","slug":"plenary-invited","status":"publish","type":"page","link":"https:\/\/nanoimprint.jp\/nnt2022\/plenary-invited\/","title":{"rendered":"Plenary\/Invited"},"content":{"rendered":"

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Speaker Name, Affiliation, Paper Title and Short Biography<\/th> <\/th>\n<\/tr>\n<\/thead>\n
Plenary Speakers<\/td><\/td>\n<\/tr>\n
Toshiki Ito, CANON, Japan<\/Strong>
\n\"\"
\n<\/td>		Paper Title
\nDevelopment of Nanoimprint Lithography Tool
\n<\/td>\n<\/tr>\n
Short Biography
\nToshiki ITO, a Senior Scientist at Semiconductor Production Equipment Unit, Canon Inc., is currently in charge of development of the resist material for nanoimprint lithography.
\nHe obtained a master's degree in chemistry from the Department of Chemistry, Graduate School of Science, Kyoto University.
\nHe worked for a chemical company in Japan for three years after graduation and has been working for Canon since 2003.
\nHe has been focusing on R&D of photoresist materials and photo-curable compositions for more than 20 years.<\/td>\n<\/tr>\n
Masayuki Abe, Asahi Kasei, Japan<\/Strong>
\n\"\"<\/td>		Paper Titel
\nDevelopment of Smart Logistic Solution Using Flexible Sensor with R2R Submicron Electrode Formation Technology<\/td>\n<\/tr>\n
Short Biography
\nGraduated from the Graduate School of Mechanical Engineering, Kyushu University in 1995, and joined Asahi Kasei Corporation in the same year. Engaged in production technology development and was in charge of developing polymer processing processes for films and other products. Later, he was engaged in the development of nanoimprinting and printed electronics technologies for the purpose of improving film functionality. Currently in charge of anti-counterfeiting solution business using flexible devices based on these technologies.<\/td>\n<\/tr>\n
Anupam MITRA, Kioxia, Japan<\/Strong>
\n\"\"
\n
\n<\/td>		Paper Title
\nNanoimprint Lithography for Semiconductor Manufacturing<\/td>\n<\/tr>\n
Short Biography
\nAnupam Mitra, Chief Specialist at the Institute of Memory Technology Research and Development, KIOXIA Corporation, Japan, is currently responsible for the development of Nanoimprint tool Technology.
\nHe is involved in the research and development of Nanoimprint technology since late 2004 and joined KIOXIA Corporation, formerly known as Toshiba Memory Corp. in 2015.
\nDr. Mitra has completed his MSc in Chemistry from Indian Institute of Technology, Kharagpur, India and received his Ph.D degree in 1998 from Indian Institute of Technology, Mumbai, India.
\nHe is currently a member of IEEE EDS technical committee of semiconductor manufacturing.<\/td>\n<\/tr>\n
Helmut Schift, Paul Scherrer Institut, Switzerland<\/Strong>
\n\"\"
\n<\/td>		Paper Title
\nBack to the future - nanoimprint revisited<\/td>\n<\/tr>\n
Short Biography
\nHelmut Schift studied electrical engineering at University of Karlsruhe, Germany and performed his Ph.D. studies at the Institute of Microtechnology Mainz, Germany. After his graduation in 1994, he joined Paul Scherrer Institute (PSI) in Switzerland as a research staff member, where he heads the Advanced Nanomanufacturing Group in the Laboratory for Nano- and Quantumtechnology. Since more than 25 years, he is involved in the development of nanoimprint lithography as an alternative nanopatterning method. He has worked in national and international projects and on a range of applications and is author of several book chapters and reviews.
\n<\/td>\n<\/tr>\n
Thanner Christine, EV Group, Austria<\/Strong>
\n\"\"
\n<\/td>		Paper Title
\nNanoimprinting \u2013 From Niche to High Volume Manufacturing
\n<\/td>\n<\/tr>\n
Short Biography
\nChristine Thanner is a Technology Development engineer at EV Group headquarters in St. Florian, Austria with focus on Nanoimprint Lithography. She graduated from the Fachhochschule M\u00fcnchen and worked for Siemens developing Epitaxie processes for VICSEL lasers before joining Infineon as metrology and failure mode analysis engineer with focus on high voltage diodes. Christine joined EV Group 2002 where she started looking into Nanoimprintlithography Technology. Her current work takes advantage of the experience of 20 years developing nano imprint lithography materials, processes and equipment.<\/td>\n<\/tr>\n
Stella W. Pang, City University of Hong Kong<\/Strong>
\n
\n\"\"<\/td>		Paper Title: Nanoimprint Technology for Plasmonic Sensors and Metadevices<\/td>\n<\/tr>\n
Short Biography
\nStella W. Pang is a Chair Professor and the Head of the Department of Electrical Engineering, City University of Hong Kong, and also the Director of the Center for Biosystems, Neuroscience, and Nanotechnology. She has over 400 technical articles, book chapters, and invited presentations. She has ten patents granted in nanotechnology and microsystems and four pending. Her research interests include nanofabrication technology for biomedical, microelectromechanical, microelectronic, and optical devices. Dr. Pang is a Fellow of IEEE, ECS, AVS, and HKIE.<\/td>\n<\/tr>\n
Invited Speakers<\/td>\n<\/tr>\n
Hongbo Lan, Qingdao University of Technology, Qingdao, China<\/Strong>
\n\"\"
\n<\/td>		Paper Title
\nElectric-field-driven jet deposition micro-nano 3D printing and its applications in manufacturing advanced circuits and electronics<\/td>\n<\/tr>\n
Short Biography
\nProf. Hongbo Lan is now a full professor and a director in Shandong Engineering Research Center for Additive Manufacturing, Nanomanufacturing and Nano-Optoelectronics Lab, Qingdao University of Technology. His current research interests include micro\/nano-scale 3D printing, large-area nanoimprint lithography, additive manufacturing, etc. He is the author and co-author of one book, over 120 scientific papers in journals and conferences. He held 45 China granted patents and 3 U.S granted patents. He was elected as national outstanding middle-aged and young expert, received special government allowances of the State Council. He is a Committee member of ISO\/TC 261 (Additive Manufacturing) since 2017.<\/td>\n<\/tr>\n
Jan Matthijs ter Meulen, Morponics, The Netherlands<\/Strong>
\n\"\"<\/td>		Paper Title: Roll-to-Plate Nanoimprint Lithography for mass manufacturing of NanoOptics <\/td>\n<\/tr>\n
Short Biography
\nCo-founder and CTO Morphotonics,
\n
\nAs CTO and Co-founder responsible for the development of innovative imprint processes and materials for different nano-imprint applications. In this role also guiding the business development team, bridging the gap from customer ideas to Roll-to-Plate mass production.
\nThe background is in optics, having a master in Physics and Business Administration. After university
\nworked at Philips developing the Blu-ray Disc, from writing the book-spec to the start-up of the Blu-ray RW pilot-production. Later-on worked at Moserbaer India, transferring the BD production to India. has As OLED R&D team leader, integrated light management textures to improve the OLED efficiency.
\n<\/td>\n<\/tr>\n
Heon Lee, Korea Univ., Korea<\/Strong>
\n
\n\"\"<\/td>		Paper Title: Nanoimprinted meta-surface(meta-lens)<\/td>\n<\/tr>\n
Short Biography
\nMeta-surface (meta-lens) is a promising next generation optical element. Meta-surface consists of the array of nano-antenna which are smaller than the wavelength of the light. Incoming light is captured and its phase, polarization and amplitude was altered by nano-antenna. The typical fabrication process of meta-0surface is as follows.
\nthin film deposition -> e-beam lithography -> reactive ion etching -> resist ashing
\nHowever, due to e-beam lithography step, meta-surfaces cannot be mass-produced with low fabrication cost.
\nIn this presentation, meta-surface was fabricated by nanoimprint lithography process. Polymeric imprinted stamp, replicated from the Si master, was used. High refractive index resin, a mixture of photo-curable polymer and high refractive index nano-particles, was used. By increasing the refractive index, aspect ratio of nano-antenna can be lowered. Imprinted meta-surface was then characterized.
\nWe believe that the best way to mass-produce the meta-surface is nanoimprint with high refractive index imprint resin.<\/td>\n<\/tr>\n
Takaomi Ito, Elionix, Japan<\/Strong>
\n\"\"<\/td>		Paper Title: Ultra-High Throughput Electron Beam Lithography System for Nanoimprint Mold Fabrication<\/td>\n<\/tr>\n
Short Biography
\nIn 2000, completed the doctoral course at the University of Tokyo. His specialty is particle beam physics.
\nIn 2001, joined Elionix Inc. He played a central role in the development of electron beam disc mastering system. Currently, as director in charge of development technology, he is working on increasing the throughput of nano-fabrication technology.
\n<\/td>\n<\/tr>\n
James Watkins, Univ. of Massachusetts, USA <\/Strong>
\n\"\"<\/td>		Paper Title: From Visible Wavelengths to Near Infrared: Direct Nanoimprint Lithography for High Aspect Ratio, All-Inorganic Metalenses, Waveguides and Diffractive Optics<\/td>\n<\/tr>\n
Short Biography
\nJim Watkins is Professor of Polymer Science and Engineering and Director of the Institute for Hierarchical Manufacturing (IHM) at the University of Massachusetts Amherst. Professor Watkins received his B.S. and M.S. degrees in Chemical Engineering from the Johns Hopkins University and his Ph.D. in Polymer Science and Engineering from UMass. He is a recipient of the Camille Dreyfus Teacher-Scholar Award and a David and Lucile Packard Foundation Fellowship for Science and Engineering and is a fellow of the American Physical Society.
\n<\/td>\n<\/tr>\n
Fumi Nakamura, AIST, Japan<\/Strong>
\n\"\"<\/td>		Paper Title: Demonstration of Micromirror Fabrication for Co-packaged Optics
\nUsing UV Nanoimprint<\/td>\n<\/tr>\n
Short Biography
\nFumi Nakamura received the BS, MS, and Ph.D degrees in electronics and electrical engineering from Keio University in Japan, 2017, 2018, and 2021, respectively. Since 2021, she has been with The National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan. Her current research interests include silicon photonics and packaging technology for co-packaged optics.<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/strong><\/p>\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-97","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/pages\/97","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/comments?post=97"}],"version-history":[{"count":6,"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/pages\/97\/revisions"}],"predecessor-version":[{"id":600,"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/pages\/97\/revisions\/600"}],"wp:attachment":[{"href":"https:\/\/nanoimprint.jp\/nnt2022\/wp-json\/wp\/v2\/media?parent=97"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}