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TOPIC |
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1) Processes (Thermal , UV, R to R, others)
2) Large area and high throughput approaches
3) Materials (Resist, Anti-sticking)
4) Template
5) Tools
6) Modelling, simulation and inspection
7) Related and emerging methods(soft lithography, self-assembly, others)
8) Applications (Electronics, Integrated circuit, Optics, Bio, Energy,
other micro-nano devices)
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Paper Deadline |
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June 12, 2014
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Conference Committee Chair |
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Shinji Matsui (Univ. of Hyogo, Japan) |
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Conference Co-Chair: |
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Ryutaro Maeda (AIST, Japan)
Eung-Sug Lee (KIMM, Korea)
Fuh-Yu Chang (National Taiwan Univ. of Sci. and Technol., Taiwan)
Hong Yee Low (Singapore Univ. of Technol. and Design, Singapore) |
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International Steering Committee: |
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Stephen Y. Chou（Princeton Univ., USA）
Eung-Sug Lee (KIMM. Korea)
Shinji Matsui (Univ. of Hyogo, Japan)
Lars Montelius ( Lund Univ., Sweden)
Douglas Resnick (Canon Nanotechnologies Inc., USA)
Helmut Schift (Paul Scherrer Inst., Switzerland) |
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Program Committee Chair: |
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Yoshihiko Hirai (Osaka Pref. Univ., Japan) |
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Program Committee Co-Chair:
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Hiroshi Hiroshima (AIST, Japan)
Akihiro Miyauchi (Hitachi, Japan)
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Executive Committee Chair:
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Masaru Nakagawa (Tohoku Univ., Japan)
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Executive Committee Co-Chair:
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Atsushi Yokoo (NTT, Japan) |
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Executive Committee Members: |
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Satoshi Akutagawa (Toppan Printing, Japan)
Tanemasa Asano (Kyushu Univ., Japan)
Morihisa Houga (DNP, Japan)
Hiroaki Kawata (Osaka Pref. Univ., Japan)
Naoko Kihara (Toshiba, Japan)
Hideo Kobayashi (HOYA, Japan)
Mitunori Kokubo (Toshiba Machine, Japan)
Shoichi Kubo (Tohoku Univ., Japan)
Jun Mizuno (Waseda Univ., Japan)
Yasushi Mori (Toyo Gosei, Japan)
Yukinori Ochiai (AIST, Japan)
Makoto Okada (Univ. of Hyogo, Japan)
Nobuji Sakai (Samsung R&D Inst. Japan, Japan)
Hiroshi Sakamoto (Asahi Glass, Japan)
Jun Taniguchi (Tokyo Sci. of Univ., Japan)
Yoshihiro Todokoro (Nara Inst. of Sci. and Technol., Japan)
Hidetami Yaegashi (Tokyo Electron, Japan)
Masaaki Yasuda (Osaka Pref. Univ., Japan) |
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Program Committee Members
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ASIA
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Jun-Ho Jeong (Korea Institute of Machinery & Materials, Korea)
Stella Pang (City Univ. of Hong Kong, Hong Kong)
Jun Taniguchi (Tokyo Sci. of Univ., Japan)
Hong Yee Low (Singapore Univ. of Technol. and Design,
Singapore)
Kouji Asakawa (Toshiba Corporation, Japan)
Yifang Chen (Fudan Univ., China)
Ta-Hsin Chou (ITRI, Taiwan)
Haixiong Ge (Nanjing Univ., China)
Hisao Kikuta (Osaka Pref. Univ., Japan)
Heon Lee (Korea Univ., Korea)
Nan Lyu (Jilin Univ., China)
Ryutaro Maeda (AIST, Japan)
Shinji Matsui (Univ. of Hyogo, Japan)
Jun Mizuno (Waseda University, Japan)
Masaru Nakagawa (Tohoku Univ., Japan)
Junji Nishii (Hokkaido Univ., Japan)
Motoki Okinaka (CANON, Japan)
Nobuji Sakai (Samsung R&D Inst. Japan, Japan)
Masamitsu Shirai (Osaka Pref. Univ., Japan)
Lon A. Wang (National Taiwan Univ., Taiwan)
Atsushi Yokoo (NTT, Japan)
Masaru Yoshimoto (Tokyo Inst. of Technol, Japan)
Fuh-Yu Chang (Nat'l Taiwan Univ. of Sci & Tech, Taiwan) |
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Europe
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Jouni Ahopelto (VTT Helsinki, Finland)
Lars Montelius (Lund Univ., Sweden)
Clivia M. SotomayorTorres (Catalan Institute of Nanotechnology, Spain)
Hella-Christine Scheer (Bergische Univ., Germany)
Brian Bilenberg (NIL Technology Aps, Denmark)
Yong Chen (Ecole Normale Superieure, France)
Anders Kristensen (Technical University of Denmark, Denmark)
Stefan Landis (CEA LETI, France)
Massimo Tormen (IOM-CNR, Italy)
Michael Muehlberger (Profactor GmbH, Austria)
Helmut Schift (Paul Scherrer Institut, Switzerland)
Marc Verschuuren (Philips Research, Netherlands)
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North America
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Jay Guo (Univ. of Michigan, USA)
Stephen Y. Chou (Princeton Univ., USA)
Doug Resnick ((Canon Nanotechnologies Inc., USA)
S.V. Sreenivasan (Univ. of Texas at Austin, USA)
Grant Willson (Univ.of Texas at Austin, USA)
Fabian Peace (Univ. of Stanford, USA)
Christophe Peroz (aBeam Technologies and LBNL, USA)
Hayden Taylor (Univ. of California, USA) |
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| Copyright(C) Since 2013, 13th International Conference on Nanoimprint and
Nanoprint Technology, All Rights Reserved. |
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