13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014)
October 22-24, 2014, ANA Crowne Plaza Kyoto, Kyoto, Japan
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1) Processes (Thermal , UV, R to R, others)
2) Large area and high throughput approaches
3) Materials (Resist, Anti-sticking)
4) Template
5) Tools
6) Modelling, simulation and inspection
7) Related and emerging methods(soft lithography, self-assembly, others)
8) Applications (Electronics, Integrated circuit, Optics, Bio, Energy, other micro-nano devices)
Paper Deadline
June 12, 2014

Plenary Talk
Status and Future of Nanoimprint (Plenary)
 Stephen Y Chou (Princeton Univ., USA)

Plenary Talk
Japan's Manufacturing Industry (Plenary)
Kiyoshi Sawaki (METI, Japan)

Invited Speaker
Size effects in nanoimprinted structures and manufacturing flows (Invited)
  Graham L.W. Cross (Trinity College Dublin, Ireland)

Invited Speaker
The Prospects of Design for Roll to Roll Lithography: Layout Refinement Utilizing Process Simulation (Invited)
  Sachiko Kobayashi (Toshiba, Japan)

Invited Speaker
Material characterization issue for NIL simulation (Invited)
  Stéfan Landis (LETI, France)

Invited Speaker
Enhanced Performance of Organic Devices by Optical-functional Pattern (Invited)
  Heon Lee (Korea Univ., Korea)

Invited Speaker
Soft Photo-Mask Lithography and Its Industrial Application on Patterned
Sapphire Substrate (PSS) of Light-Emitting Diode (LED) (Invited)
  Yung-Chun Lee (National Cheng Kung Univ., Taiwan)

Invited Speaker
Ultrafast Nanoimprint Lithography on Full Wafers (Invited)
  Massimo Tormen (Thunder NIL, Italy)

Invited Speaker
Jet and Flash Imprint Lithography for the High Volume Manufacturing of Semiconductor Devices (Invited)
  Doug Resnick (Canon Nanotechnologies Inc., USA)

Invited Speaker
A Direct Imprinting for Fine Metal Oxide Patterns and Devices (Invited)
  Tatsuya Shimoda (JST-ERATO and JAIST, Japan)

Invited Speaker
Nanoimprint Fabrication and Application of Subnano-Scale Surface-Patterned Glassy Substrates (Invited)
  Geng Tan (Tokyo Inst. of Technol., Japan)

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