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TOPIC |
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1) Processes (Thermal , UV, R to R, others)
2) Large area and high throughput approaches
3) Materials (Resist, Anti-sticking)
4) Template
5) Tools
6) Modelling, simulation and inspection
7) Related and emerging methods(soft lithography, self-assembly, others)
8) Applications (Electronics, Integrated circuit, Optics, Bio, Energy,
other micro-nano devices)
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Paper Deadline |
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June 12, 2014
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Plenary Talk |
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Status and Future of Nanoimprint (Plenary)
Stephen Y Chou (Princeton Univ., USA)
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Plenary Talk |
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Japan's Manufacturing Industry (Plenary)
Kiyoshi Sawaki (METI, Japan)
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Invited Speaker |
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Size effects in nanoimprinted structures and manufacturing flows (Invited)
Graham L.W. Cross (Trinity College Dublin, Ireland)
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Invited Speaker |
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The Prospects of Design for Roll to Roll Lithography: Layout Refinement
Utilizing Process Simulation (Invited)
Sachiko Kobayashi (Toshiba, Japan)
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Invited Speaker |
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Material characterization issue for NIL simulation (Invited)
Stéfan Landis (LETI, France)
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Invited Speaker |
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Enhanced Performance of Organic Devices by Optical-functional Pattern (Invited)
Heon Lee (Korea Univ., Korea)
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Invited Speaker |
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Soft Photo-Mask Lithography and Its Industrial Application on Patterned
Sapphire Substrate (PSS) of Light-Emitting Diode (LED) (Invited)
Yung-Chun Lee (National Cheng Kung Univ., Taiwan)
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Invited Speaker |
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Ultrafast Nanoimprint Lithography on Full Wafers (Invited)
Massimo Tormen (Thunder NIL, Italy)
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Invited Speaker |
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Jet and Flash Imprint Lithography for the High Volume Manufacturing of
Semiconductor Devices (Invited)
Doug Resnick (Canon Nanotechnologies Inc., USA)
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Invited Speaker |
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A Direct Imprinting for Fine Metal Oxide Patterns and Devices (Invited)
Tatsuya Shimoda (JST-ERATO and JAIST, Japan)
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Invited Speaker |
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Nanoimprint Fabrication and Application of Subnano-Scale Surface-Patterned
Glassy Substrates (Invited)
Geng Tan (Tokyo Inst. of Technol., Japan)
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| Copyright(C) Since 2013, 13th International Conference on Nanoimprint and
Nanoprint Technology, All Rights Reserved. |
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