19th International Conference on Nanoimprint and Nanoprint Technology (NNT 2020)
October 7-9, Toyama International Conference Center, Japan
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TOPIC
1) Processes (Thermal , UV, R to R, others)
2) Large area and high throughput approaches
3) Materials (Resist, Anti-sticking)
4) Template
5) Tools
6) Modelling, simulation and inspection
7) Related and emerging methods(soft lithography, self-assembly, others)
8) Applications (Electronics, Integrated circuit, Optics, Bio, Energy, other micro-nano devices)


Under Negotiation

Conference Committee Chair:
Yoshihiko Hirai (Osaka Pref. Univ., Japan)

Conference Committee Co-Chair
Fuh-Yu Chang (National Taiwan Univ. of Sci. and Technol., Taiwan)
Hiroshima Hiroshi (AIST, Japan)
Eung-Sug Lee (KIMM, Korea)
Ryutaro Maeda (Xi'an Jiaotong Univ., China)
Masaru Nakagawa (Tohoku Univ., Japan)
Stella Pang (City Univ. of Hong Kong, Hong Kong)
JInyou Shao (Xi'an Jiaotong Univ., China)

Advisory
Shinji Matsui (Emeritus, Univ. of Hyogo)
Masanori Komuro (Emeritus, KEK)

Program Committee Chair
Jun Taniguchi (Tokyo Univ. of Sci., Japan)

Program Committee Co-Chair
Koji Asakawa (KIOXIA, Japan)
Akihiro Miyauchi (Tokyo Medical and Dental Univ., Japan)
Jun Mizuno (Waseda Univ., Japan)

Executive Committee Chair
Satoshi Takei (Toyama Pref. Univ., Japan)

Executive Committee Member
Kentaro Taki (Kanazawa Univ., Japan)
Kazuhiro Tada (Natl. Inst. of Technol., Toyama College, Japan)











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