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The 3rd Asian Symposium on Nano Imprint Lithography (ASNIL 2010) |
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ASNIL 2010
June 30 - July 2, 2010
Tsukuba International Conference Center, Tsukuba, Japan |
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WHAT'S NEW |
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 ASNIL 2010 PROGRAM_Ver4.pdf (29KB)
(June 18, 2010, Final Program)
ASNIL 2010 Floor Map (216kB)
Registration Desk (On-site Registration)
16:00-18:30, June 30
8:20-17:30, July 1
8:30-15:00, July 2
June 30-July 2, 2010
Secretariat : TEL: +81-3-3420-1800
On-line Registration and Hotel Accomodation for ASNIL 2010
are now open. Pre-Registration Deadline is June 10, 2010.
 Registration and Hotel Accomodation Site(Pre-Registration Deadline is June
10).
Pre- Full Conference with CD ROM, Abstract and Banquet
JPY30,000
On-siteFull Conference with CD ROM, Abstract and Banquet
JPY40,000
Student Full Conference with CD ROM, Abstract and Banquet
JPY15,000
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TOPIC |
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Nanoimprint
Nanoprint
Soft-Lithography
Dip-pen Lithography
Tooling
Application |
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CONFERENCE SITE |
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REGISTRATION FEE |
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Pre- Full Conference with CD ROM, Abstract and Banquet
JPY30,000
On-siteFull Conference with CD ROM, Abstract and Banquet
JPY40,000
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Student Full Conference with CD ROM, Abstract and Banquet
JPY15,000 |
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CONTACT |
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Secretariat for ASNIL 2010
c/o Secretaryart Corporation
TEL: +81-3-3420-1800 FAX: +81-3-3420-1840 |
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| Copyright(c) Since 2009, The 3rd Asian Symposium on Nano Imprint Lithography
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