The 3rd Asian Symposium on Nano Imprint Lithography (ASNIL 2010) HOME   Program Purpose Exhibition  Committee   Travel Invited   Japanese    ASNIL 2010 June 30 - July 2, 2010 Tsukuba International Conference Center, Tsukuba, Japan 　PURPOSE 　　Nanoimprint technology has been developed from hot emboss technology including well-known optical disk fabrication. At present, nanoimprint technology allows us to make 3D architectures in nanometer dimension.　Since Prof. S.Y. Chou in University of Minnesota of those days reported the nanoimprint technology as an advanced high-resolution, high-throughput, and cost-effective way in 10nm-scale nanofabrication, the field of nanoimprint technology grows rapidly and the researchers have been increased markedly in universities, institutes, and companies. 　　In addition to the advanced hot emboss technology transforming and molding thermoplastic polymers above their glass transition temperature, other nanoimprint technologies are proposed such as UV nanoimprint lithography with photo-curable liquid resins, soft-lithography with soft poly(dimethylsiloxane), PDMS, molds, room temperature nanoimprint lithography with SOG materials or with solvents.  Moreover, several vendors and suppliers dealing with nanoimprint apparatuses, specific resins, molds and relatives appear, and there are a lot of business chances at present. 　　In parallel to development of nanoimprint apparatuses, related materials, and processes, the applications to various devices are in progress.  There have been reports on bio-devices, semiconductor devices, optical devices, 3D nanostructures and so forth from standpoints of academic research phases to commercial phases.  In the international roadmap of 2008 on semiconductor technology, the nanoimprint technology is a candidate for 22 nm-node and smaller-node lithography.  For the objective, nanoimprint apparatuses equipped with high-precision alignment technology have been studied as one of infrastructures in nanotechnology, and the importance of nanoimprint technology has been recognized again.  It is necessary to communicate advanced information among related science fields and to conduct fruitful fusion from a comprehensive standpoint, in order to reply such social requests for the nanoimprint technology and to realize 21st century ubiquitous society by providing nanostructure-based bio/medical chips, information technology devices and so on at high-throughput and cost-effective ways. 　　The 3rd Asian Symposium on Nanoimprint Technology will be held at Tsukuba, Japan on June 30 – July 2, 2010, by taking accounts of activated backgrounds in nanoimprint lithography mentioned above.  The 1st symposium was held in Korea in 2008, and the 2nd symposium was held in Taiwan in 2009.  The 3rd symposium will be held in Japan in 2010, according to strong requests for the Asian Symposium on Nanoimprint Lithography from Asian families comprising universities, institutes, and companies. 　   Copyright(c) Since 2009, The 3rd Asian Symposium on Nano Imprint Lithography .