The 3rd Asian Symposium on Nano Imprint Lithography (ASNIL 2010) HOME   Program Purpose Exhibition  Committee   Travel Invited   Japanese    ASNIL 2010 June 30 - July 2, 2010 Tsukuba International Conference Center, Tsukuba, Japan 　COMMITTEE MEMBERS Organizing Committee Chair Dr. Masanori Komuro (NEDO, Japan) Committee Chair Japan: Prof. Shinji Matsui (Univ. of Hyogo) Committee Vice Chair Japan: Dr. Ryutaro Maeda (AIST) Korea: Dr. Eung-Sung Lee (KIMM) Taiwan: Dr. Jen-Hui Tsai (ITRI) Singapore: Dr. Lim Khiang Wee (IMRE) Program Chair Japan: Prof. Yoshihiko Hirai ( Osaka Pref. Univ.) Program Vice-Program Chair Japan: Dr. Hiroshi Hiroshima (AIST) Korea: Dr.Jun-Ho Jeong (KIMM) Taiwan: Dr. Fuh-Yu Chang (National Taiwan Univ. Sci. and Technol.) Singapore: Dr. Hong Yee Low (IMRE) Members Koji Asakawa (Toshiba) Tanemasa Asano (Kyushu Univ.) Naoya Hiruta (Toppan Printing) Morihisa Houga (DNP) Yasuhide Kawaguchi (Asahi Glass) Mitunori Kokubo (Toshiba Machine) Iwao Miyamoto (Tokyo Univ. of Science) Akihiro Miyauchi (Hitachi) Osamu Nagarekawa (HOYA) Masaru Nakagawa (Tohoku Univ.) Yukinori Ochiai (Toyo Gosei) Yutaro Okuno (Omron) Nobuji Sakai (Samsung Yokohama Res. Inst.) Masaharu Takahashi (AIST) Yoshihiro Todokoro (Nara Inst. of Sci. and Technol.) Hidetami Yaegashi (Tokyo Electron) Atsushi Yokoo (NTT) 　   Copyright(c) Since 2009, The 3rd Asian Symposium on Nano Imprint Lithography .