The 3rd Asian Symposium on Nano Imprint Lithography (ASNIL 2010) HOME   Program Purpose Exhibition  Committee   Travel Invited   Japanese    ASNIL 2010 June 30 - July 2, 2010 Tsukuba International Conference Center, Tsukuba, Japan 　INVITED SPEAKERS July 1, 2010 Enhancement of Conversion Efficiency of Solar Cells using Nano-Sized Anti-Reflection Patterns Devices 　Heon Lee (Korea Univ., Korea) High Intensity LED Process using Polymer Mold in NIL Process (tentative) 　Hiromi Nishihara (Toshiba Machine, Japan) Roll-to-Roll Nanoimprinting for Optical Applications 　Jouni Ahopelto (VTT Microsystems and Nanoelectronics, Finland) July 2, 2010 Nanoimprint of Gratings on a Bulk Metallic Glass 　Jinn P. Chu (National Taiwan Univ. of Sci. and Technol., Taiwan) Glass-imprinting for Optical Device Fabrication 　Junji Nishii (Hokkaido Univ., Japan) Nanoimprinting for Chemical Synthesis 　Hong Yee Low (IMRE, Singapore) Moth-Eye Antireflection Surface Using Anodic Porous Alumina- Continuous Roll Imprinting - 　Yoshihiro Uozu (Mitsubishi Rayon, Japan) 　   Copyright(c) Since 2009, The 3rd Asian Symposium on Nano Imprint Lithography .