Program
 NNT 2022 Final Program and Floor Map |
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| Date | JP, Asia | EU(Paris) | US(east) | US(west) | PROGRAM | Time zone | |
| 5-Oct | afternoon 2h | 12:00-14:50 | (5:00-7:50) | (23:00-1:50) | (20:00-22:50) | Opening and plenary | for World |
| 14:50-15:50 | (7:50-8:50) | (1:50-2:50) | (22:50-23:50) | On-site: Industrial exhibition On-line: Industrial exhibition short demo movie | for World | ||
| evening 3h | 16:00-19:20 | (9:00-12:20) | (3:00-6:20) | (0:00-3:20) | Oral presentations | for EU | |
| 6-Oct | morning 2h | 8:40-10:30 | (1:40-3:30) | (19:40-21:30) | (16:40-18:30) | Oral presentations | for World |
| morning 1h | 10:50-11:50 | (3:50-4:50) | (21:50-22:50) | (18:50-19:50) | Industrial exhibition oral presentation 1 | for World | |
| afternoon 2h | 12:00-14:20 | (5:00-7:20) | (23:00-25:20) | (20:00-22:20) | Poster session short presentation | for World | |
| 14:20-16:00 | (7:20-9:00) | (1:20-3:00) | (22:20-0:00) | On-site: Poster session & Industrial exibision | for JP | ||
| evening 3h | 16:00-19:00 | (9:00-12:00) | (3:00-6:00) | (0:00-3:00) | Oral presentations | for EU | |
| 7-Oct | morning 2h | 9:00-10:50 | (2:00-3:50) | (20:00-21:50) | (17:00-18:50) | Oral presentation | for US |
| morning 1h | 11:00-12:00 | (4:00-5:00) | (22:00-23:00) | (19:00-20:00) | Industrial exhibition oral presentation 2 | for World | |
| afternoon 2h | 12:10-14:20 | (5:10-7:20) | (23:10-1:20) | (23:10-1:20) | Plenary and closing | for World | |
| NNT 2022 Program |
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| October 5, 2022 Session Room: Room A (2F) Technical Exhibition, Poster Session and Coffee Break (3F) |
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| 5A-1: Opening and Plenary Session I (12:00-14:50) | |
| 5A-1-1 12:00-12:10 | Opening Remark Prof. Y. Hirai (Osaka Metrpolitan Univ., Japan) |
| 5A-1-2 12:10-12:50 | (Plenary) Stephen Y. Chou, Princeton Univ., USA |
| 5A-1-3 12:50-13:30 | Nanoimprinting – From Niche to High Volume Manufacturing (Plenary) Thanner Christine, EV Group, Austria |
| 5A-1-4 13:30-14:10 | Nanoimprint Lithography for Semiconductor Manufacturing (Plenary) Anupam MITRA, KIOXIA, Japan |
| 5A-1-5 14:10- 14:50 | (Plenary) Masayuki Abe, Asahi Kasei, Japan |
| 5A-2: Video & industry I (14:50-15:50) (Video Session) | |
| 5A-2-T1 14:50-14:55 | GEOMATEC Co., Ltd. |
| 5A-2-T2 14:55-15:00 | Autex Inc. |
| 5A-2-T3 15:00-15:05 | Meisho Kiko Co., Ltd. |
| 5A-2-T4 15:05-15:10 | Canon Inc. |
| 5A-2-T5 15:10-15:15 | Iwasaki Electric Co., Ltd. |
| 5A-2-T6 15:15-15:20 | Ohara Quartz.Co.,Ltd. |
| 5A-2-T7 15:20-15:25 | TOKYO OHKA KOGYO CO., LTD. |
| 5A-2-T8 15:25-15:30 | ZEON CORPORATION |
| 5A-2-T9 15:30-15:35 | Obducat AB |
| 5A-2-T10 15:35-15:40 | Gunei Chemical Industry Co., Ltd. |
| 5A-2-T11 15:40-15:45 | TAZMO CO., LTD. |
| 5A-2-T12 15:45-15:50 | KYODO INTERNATIONAL INC. |
| 5A-3: Evening Session I (16:00-17:30) | |
| 5A-3-1 16:00-16:30 | Roll-to-Plate Nanoimprint Lithography for mass manufacturing of NanoOptics (Invited) Jan Matthijs ter Meulen, Morponics, The Netherlands |
| 5A-3-2 16:30-16:50 | High-resolution nanoimprint lithography of pharmaceutical ingredients containing volatile solvents achieved with gas-permeable porous mold Rio Yamagishi 1, Sayaka Miura 1, Kaori Yasuda 1, Riku Miyazaki 1, Yuki Kawano 2, Yoshiyuki Yokoyama 2, Naoto Sugino 3, Takao Kameda 3, Satoshi Takei 1, 1 Toyama Pref. Univ., 2 Toyama Industrial Technol. Res. and Development Center and 3 Sanko Gosei, Japan |
| 5A-3-3 16:50-17:10 | Nanoimprinted speckle patterns for mechanical testing using digital image correlation analysis E.C. Kursun 1, S. Supreeti 2, K.G.F. Janssens 1, H. Schift 1, P. Spätig 1, 1 Paul Scherrer Inst., Switzerland, 2 Technische Univ. Ilmenau, Germany |
| 5A-3-4 17:10-17:30 | Defect reduction technology in replica template process Ryo Kobayashi, Akihiko Ando, Hideaki Sakurai and Shingo Kanamitsu, Kioxia, Japan |
| 17:30-17:50 | Break |
| 5A-4: Evening Session II (17:50-19:20) | |
| 5A-4-1 17:50-18:20 | Nanoimprinted meta-surface(meta-lens) (Invited) Heon Lee, Korea Univ., Korea |
| 5A-4-2 18:20-18:40 | Chiral Crystallization Directed by Chiral Near-Field Force with Nanostructured Plasmonic Metasurfaces Hiromasa Niinomi 1, An-Chieh Cheng 2, Teruki Sugiyama 3, Miho Tagawa 4, Hiroshi Yoshikawa 5, Satoshi Uda 1, Tomoya Oshikiri 1 and Masaru Nakagawa 1, 1 Tohoku Univ., 2 Hokkaido Univ., 3 National Yang Ming Chiao Tung Univ., Taiwan, 4 Nagoya Univ., 5 Osaka Univ., Japan |
| 5A-4-3 18:40-19:00 | NIL-Based Patterning of Chemically Strengthened Glasses João Gaspar 1, Ye Zhou 1, Prasanna Venkatesh Krishnan 1, Kristian Thulin 1, Patrik Lundström 1, Virginia Soares 2 and Virginia Chu 2, 1 Obducat Technologies, Sweden and 2 INESC MN, Portugal |
| 5A-4-4 19:00-19:20 | Effects of planetary spin-coating on the preparation of thin films for imprinting Kazuki Tokumaru and Koichiro Ogata, Natl. Inst. of Technol., Oita College, Japan |
| October 6, 2022 | |
| 6A-5: Morning Session I (8:40-10:30) | |
| 6A-5-1 8:40-9:10 | From Visible Wavelengths to Near Infrared: Direct Nanoimprint Lithography for High Aspect Ratio, All-Inorganic Metalenses, Waveguides and Diffractive Optics Vincent J. Einck, Andrew McClung, Dae Eon Jung, Amir Arbabi and James J. Watkins, Univ. of Massachusetts, USA |
| 6A-5-2 9:10-9:30 | Filler-Free NIL Compatible Ultra-High Refractive Index Resins for Patterning Diffractive Optical Elements Carlos Pina-Hernandez and Keiko Munechika, HighRI Optics, USA |
| 6A-5-3 9:30-9:50 | Atom-scale-precision fluorescence alignment demonstrated by computational simulation Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa and Masaru Nakagawa, Tohoku Univ., Japan |
| 6A-5-4 9:50-10:10 | High efficiency crystalline metalens with TiO2 sol gel process Wonjoong Kim 1, Joohoon Kim 2, Chanwoong Park 1, Hojung Choi 1, Ick Chan Joo 3, Junsuk Rho 2,4,5 and Heon Lee 1, 1 Korea Univ., 2 POSTECH, 3 MIRTEC, 4 POSCO-POSTECH-RIST and 5 NINT, Korea |
| 6A-5-5 10:10-10:30 | Photoluminescence enhancement by electric and magnetic surface lattice resonance in ZrO2 nanoparticle arrays M. Higashino, S. Murai, T. Y. Lo, S. Tomita, K. Tanaka, Kyoto Univ., Japan |
| 10:30-10:50 | Coffee Break (3F) |
| 6A-6: Oral & industry I (10:50-11:50) (Pending) | |
| 6A-6-T1 10:50-11:00 | GEOMATEC Co., Ltd. |
| 6A-6-T2 11:00-11:10 | Autex Inc. |
| 6A-6-T3 11:10-11:20 | Meisho Kiko Co., Ltd. |
| 6A-6-T4 11:20-11:30 | Canon Inc. |
| 6A-6-T5 11:30-11:40 | Iwasaki Electric Co., Ltd. |
| 6A-6-T6 11:40-11:50 | Ohara Quartz.Co.,Ltd. |
| 6A-7: Poster Short Presentation (Video Session) (12:00-14:20) |
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| 6A-7-P1 12:00-12:05 | Withdrawn Simon Drieschner, Fabian Kloiber, Priya Sai, Wiljan Stouwdam, Wouter Brok, Vijay R. Kolli and Marc Hennemeyer, SUSS MicroTec Solutions, Germany |
| 6A-7-P2 12:05-12:10 | Gas-permeable porous mold in nanoimprint lithography for super engineering plastic Satoshi Takei 1, Sayaka Miura 1, Rio Yamagishi 1, Naoto Sugino 2, Takao Kameda 2, Yuki Kawano 3 and Yoshiyuki Yokoyama 3, 1 Toyama Pref. Univ., 2 Sanko Gosei and 3 Toyama Industrial Technol. Res. and Devel. Center, Japan |
| 6A-7-P3 12:10-12:15 | Formation of the atomically stepped surface of the spin-coated PEDOT:PSS conducting polymer thin film by thermal nanoimprinting Yuto Maeda 1, Naho Kaneko 1, Tomoaki Oga 1, Satoru Kaneko 2,1, Akifumi Matsuda 1 and Mamoru Yoshimoto 1, 1 Tokyo Inst. of Technol. and 2 Kanagawa Inst. Industrial. Sci. & Technol., Japan |
| 6A-7-P4 12:15-12:20 | Influence of atomic-scale thermal-nanoimprint patterning and surface modification of the polymer substrate on growth of functional oxide thin films Tomoaki Oga 1, Hisashi Miyazaki 2, Satoru Kaneko 3,1, Akifumi Matsuda 1 and Mamoru Yoshimoto 1, 1 Tokyo Inst. of Technol., 2 Natl. Defense Academy and 3 Kanagawa Inst. of Industrial Sci. and Technol., Japan |
| 6A-7-P5 12:20-12:25 | High Aspect Ratio Nanopillars fabricated by UV Nanoimprint Lithography Oliver S. Maier 1, Michael J. Haslinger 1, Michael Mühlberger 1, Sonja Kopp 1, Markus Pribyl 2, Philipp Taus 2, Heinz D. Wanzenboeck 2 and Elena Guillen 1, 1 PROFACTOR and 2 Vienna Univ. of Technol., Austria |
| 6A-7-P6 12:25-12:30 | The Study of Bile Duct Stent Having Antifouling Properties Using Biomimetics Technique Atsushi Sekiguchi 1,2, 1 Osaka Metropolitan Univ. and 2 Litho Tech Japan, Japan |
| 6A-7-P7 12:30-12:35 | Computational study on the releasing process of slanted diffraction structure for AR glasses 1 Ryuhei Yamamura, 2 Yuusei Kunitou, 1 Kai Kameyama, 2 Masaaki Yasuda and 2 Yoshihiko Hirai, 1 Osaka Pref. Univ. and 2 Osaka Metropolitan Univ., Japan |
| 6A-7-P8 12:35-12:40 | Stochastic Simulation of Deactivation Effects in UV Curable Resin D. Nakamura, Y. Hirai, and M. Yasuda, Osaka Metropolitan Univ., Japan |
| 6A-7-P9 12:40-12:45 | Compatibility of Thermal Property among in Nanoimprint Resin Kai Kameyama 1, Yuusei Kunitou 2, Hiroaki Kawata 2, Masaaki Yasuda 2 and Yoshihiko Hirai 2, 1 Osaka Pref. Univ. and 2 Osaka Metropoiltan Univ., Japan |
| 6A-7-P10 12:45-12:50 | Study on smart process window design for thermal nanoimprint lithography using deep learning systems Yuusei Kunitou 1, Ryuhei Yamamura 2, Kai Kameyama 2, Masaaki Yasuda 1 and Yoshihiko Hirai 1, Osaka Metropolitan Univ. and 2 Osaka Pref. Univ., Japan |
| 6A-7-P11 12:50-12:55 | Investigation of filling behavior of UV nanoimprint by bridge structure Yusuke Murakami and Jun Taniguchi, Tokyo Univ. of Sci., Japan |
| 6A-7-P12 12:55-13:00 | Two-tone pattern transfer using nanoimprint and silver ink K. Enomoto and J. Taniguchi, Tokyo Univ. of Sci., Japan |
| 6A-7-P13 13:00-13:05 | Transfer durability of low concentration release agent coated replica mold with line and space patterns on ultraviolet nanoimprint lithography Tomohito Wakasa and Jun Taniguchi, Tokyo Univ. of Sci., Japan |
| 6A-7-P14 13:05-13:10 | Crystal growth of GaN based nanowires using SiO2 masks formed by nanoimprint lithography process Mizuki Takahashi, Shiori Yamamura, Yukimi Jinno, Nanami Nakayama, Sae Katsuro, Yuki Yamanaka, Shiori Ii, Ayaka Shima, Soma Inaba, Tetsuya Takeuchi, Motoaki Iwaya, Satoshi Kamiyama, Meijo Univ., Japan |
| 6A-7-P15 13:10-13:15 | Antibacterial property dependent with the nanopillar pitch on the plastic film Natsuki Ogawa, Tomohiro Shimizu, Shoso Shingubara, Takeshi Ito, Kansai Univ., Japan |
| 6A-7-P16 13:15-13:20 | Effect of nanopillar size on bactericidal and antibacterial properties Ikki Shingeya, Tomohiro Shimizu, Shoso Shingubara and Takeshi Ito, Kansai Univ., Japan |
| 6A-7-P17 13:20-13:25 | Selection of adhesive molecular layers with monomer-repellence and chemisorption for a shape-fixed residual layer in UV nanoimprint lithography Kanta Kawasaki, Akiko Onuma, Hiromasa Niinomi, and Masaru Nakagawa, Tohoku Univ., Japan |
| 6A-7-P18 13:25-13:30 | Prediction of Durability of the Mold for Production of Nanostructures in Ultraviolet Nanoimprint Lithography (UV-NIL) using Machine Learning Yuta Aoki, Junichiro Ono, Tomohito Wakasa, Jun Taniguchi and Shin-ichi Satake, Tokyo Univ. of Sci., Japan |
| 6A-7-P19 13:30-13:35 | Molecular dynamics study of effects of loading pressure on shear properties of organic nanofilms Naoki Matamoto and Kazuhiro Tada, National Inst. of Technol., Toyama College, Japan |
| 6A-7-P20 13:35-13:40 | Fabrication of Ag nanoantenna sticker and application to luminescence control TienYang Lo, Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., Japan |
| 6A-7-P21 13:40-13:45 | Fabrication of Flexible Sticker of Si metasurface by a Transfer Process Yuto Inoue, Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., Japan |
| 6A-7-P22 13:45-13:50 | Fabrication of rose petal effect film by moth-eye structure mold and photolithography Kazuki Araia, Takuto Wakasaa, Kazuki Fujiwaraa and Jun Taniguchia, Tokyo Univ. of Sci., Japan |
| 6A-7-P23 13:50-13:55 | Analysis of resistance against deformation stress of nanofilaments inside clingfish mimicked tape by using FEM simulation Kazuma Tsujioka 1, Yasutaka Matsuo 1,3, Yuji Hirai 2 and Masatsugu Shimomura 2, 1 Hokkaido Univ. and 2 CIST, Japan |
| 6A-7-P24 13:55-14:00 | Nanoimprint and nanoprint processes using Seamless Roller Mold Makoto Okada, Asahi Kasei, Japan |
| 6A-7-P25 14:00-14:05 | Micromolds for glass molding by the carbonization of epoxy resist made by laser direct write lithography Muhammad Refatul Haq and Helmut Schift, Paul Scherrer Inst., Switzerland |
| 6A-7-P26 14:05-14:10 | Fabrication of self-standing PMMA film with 0.5 μn through-holes by imprint and photolithography hybrid process H. Kawata, M. Yasuda, Y. Hirai, and H. Kikuta, Osaka Metropolitan Univ., Japan |
| 6A-7-P27 14:10-14:15 | Imprint process for glass nano-patterning using silica nano powder Yu Kubota and Fujio Tsumori, Kyushu Univ., Japan |
| 6A-7-P28 14:15-14:20 | MICRO-POWDER-IMPRINTING USING MOLDS WITH SIMILAR SCALE TO CERAMIC NANO PARTICLE Ryoma Taira and Fujio Tsumori, Kyushu Univ., Japan |
| 6A-8: Poster session & Industrial exhibition On-site (14:20-16:00) (3F) | |
| 6A-8 | Poster Session |
| 6A-9: Evening Session III (16:00-17:30) | |
| 6A-9-1 16:00-16:30 | Electric-field-driven jet deposition micro-nano 3D printing and its applications in manufacturing advanced circuits and electronics (Invited) Hongbo Lan, Qingdao University of Technology, Qingdao, China |
| 6A-9-2 16:30-16:50 | Hierarchical Micro-/Nanostructured Substrates for the Growth of Cardiomyocytes made by Nanoimprint Lithography Michael Mühlberger 1, Sonja Kopp 1, Alison Deyett 2, Markus Pribyl 3, Michael Haslinger 1, Anica Siegel 1, Philipp Taus 3, Elena Guillen 1, Aranxa Torres Caballero 2, Bozhidar Baltov 4, Leif Yde 5, Jan Stensborg 5, Sasha Mendjan 2, Steffen Hering 4, Heinz D. Wanzenboeck 3, 1 PROFACTOR, Austria, 2 Institute of Molecular Biotechnology, 3 Technical Univ. Wien, 4 Chanpharm, Austria and 5 Stensborg, Denmark |
| 6A-9-3 16:50-17:10 | "Development of optical anti-reflection with anti-fogging property combined with nanostructure and specially designed vacuum deposition Kazuma Kurihara and Hokari Ryohei, AIST, Japan |
| 6A-9-4 17:10-17:30 | Analysis of Elastic Contacts in Chemical Mechanical Polishing by using Nanoimprint Lithography as a Characterization Method Joscha S. Kappel 1, Robert Kirchner 2, Sascha Bott 3, Benjamin Lilienthal-Uhlig 1, Johann W. Bartha 2, 1 Fraunhofer-IPMS, 2 Dresden Univ. of Technol., 3 GlobalFoundries Dresden Module One, Germany |
| 17:30-17:50 | Coffee Break |
| 6A-10: Evening Session IV (17:50-19:00) | |
| 6A-10-1 17:50-18:20 | Demonstration of Micromirror Fabrication for Co-packaged Optics Using UV Nanoimprint (Invited) F. Nakamura 1, K. Suzuki 2, A. Noriki 2 and T. Amano 2, 1 PETRA and 2 AIST, Japan |
| 6A-10-2 18:20-18:40 | Combining UV-curable polymeric materials for advanced optical designs M. Brehm, R. Richter, M. Trinkwalder, M. Follner and S. Prinz, DELO Industrial Adhesives, Germany |
| 6A-10-3 18:40-19:00 | Antibacterial film using oligoglucosamine derivatives in nanoimprint lithography utilizing biomimetics technology Sayaka Miura 1, Rio Yamagishi 1, Riku Miyazaki 1, Kaori Yasuda 1, Naoto Sugino 2, Takao Kameda 2, Yuki Kawano 3, Yoshiyuki Yokoyama 3, Satoshi Takei 1, 1 Toyama Prefectural Univ., 2 Sanko Gosei and 3 Toyama Industrial Technol. Res. and Development Center Japan |
| October 7, 2022 | |
| 7A-11: Morning Session II (9:00-10:50) | |
| 7A-11-1 9:00-9:30 | Ultra-High Throughput Electron Beam Lithography System for Nanoimprint Mold Fabrication (Invited) Takaomi Ito 1, Takumi Watanabe 1, Satoshi Nagai 1, Sung-won Youn 2, Kenta Suzuki 2 and Hiroshi Hiroshima 2, 1 Elionix and 2 AIST, Japan |
| 7A-11-2 9:30-9:50 | Nanofabrication of metal/semiconductor/metal structure for efficient photocathode under strong coupling condition Tomoya Oshikiri 1, Xu Shi 2, Hiroaki Misawa 2,3 and Masaru Nakagawa 1, 1 Tohoku Univ., 2 Hokkaido Univ., Japan and 3 National Yang Ming Chiao Tung Univ., Taiwan |
| 7A-11-3 9:50-10:10 | Nanoimprint-based plasmonic/non-plasmonic lattices for controlling light Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., Japan |
| 7A-11-4 10:10-10:30 | A novel optical diffuser inspired by Morpho butterfly’s nanostructure enables skillful light diffusion and self-cleaning properties Kazuma Yamashita 1, Takuma Hattori 1,2, Yuji Kuwahara 1,2 and Akira Saito 1,2, 1 Osaka Univ. and 2 RIKEN Spring-8, Japan |
| 7A-11-5 10:30-10:50 | Simple Preparation of the Multi-functional Vulcanized Rubber Microstructures Yuji Hirai 1, Syun Uemura 1, Yasutaka Matsuo 2, Takahiro Okamatsu 3, Toshihiko Arita 4, Masatsugu Shimomura 1, 1 Chitose Institute of Technol., 2 Hokkaido Univ., 3 YOKOHAMA RUBBER and 4 Tohoku Univ., Japan |
| 10:50-11:00 | Break |
| 7A-12: Oral & Industry II (11:00-12:00) Pending | |
| 7A-12-T7 11:00-11:10 | TOKYO OHKA KOGYO CO., LTD. |
| 7A-12-T8 11:10-11:20 | ZEON CORPORATION |
| 7A-12-T9 11:20-11:30 | Obducat AB |
| 7A-12-T10 11:30-11:40 | Gunei Chemical Industry Co., Ltd. |
| 7A-12-T11 11:40-11:50 | TAZMO CO., LTD. |
| 7A-12-T12 11:50-12:00 | KYODO INTERNATIONAL INC. |
| 7A-13: Plenary session II (12:10-14:20) | |
| 7A-13-1 12:10-12:50 | Development of Nanoimprint Lithography Tool (Plenary) Toshiki Ito, CANON, Japan |
| 7A-13-2 12:50-13:30 | Nanoimprint Technology for Plasmonic Sensors and Metadevices (Plenary) Stella W. Pang, City Univ. of Hong Kong |
| 7A-13-3 13:30-14:10 | Back to the future - nanoimprint revisited (Plenary) Helmut Schift, Paul Scherrer Institut, Switzerland |
| 7A-13-4 14:10-14:20 | Closing Remark: Stephen Y. Chou, Princeton Univ., USA |